Plasma enhanced system

Plasma enhanced system

Fixed Assets No: F1100998

NTIS No: NFEC-2012-03-162363

Maker/Model: Aixtron/Black Magic

Standard classification: Machining / Experimental equipment > Semiconductor equipment > PECVD Equipment

Equipment Departments: Department of Information & Communication Engineering

Description
Specifications
Plasma generator
Max voltage current power = 800V 2.5A 1kW
Type = dc + variable frequency (1-100kHz)
Control = simultaneous voltage current power regulation selectable frequency selectable reverse time
Power supply parameters = unlimited storeable parameters on-the-fly configurable or loaded during recipeControl system
Manual operation and
Automatic recipe execution using time based or event based programming
Integrated recipe editor
Recipes with variable parameters for users
Real time video of process
System data/parameter recording
Consumables recording
Logging of actions
Remote monitoring and recipe execution over TCP/IP (needs remote workstation)Control server
Rackmount server with Intel Quad-core CPU 2Gb RAM 2 x 500Gb SATA HDD LAN DVI DVD-RW floppy drive USB card reader
Monitor with 1920×1080 resolution

Carbon CVD growth시 plasma를 발생시킴
Gas Ion에 field 를 주어 수직의 CNT growth 에 사용
표면 etching효과를 주어 불순물질 생성을 최소화하는데 사용

Applications

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